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Tantalum

  • Tantalum sputtering target
Tantalum sputtering target

Tantalum sputtering target

  • Material: R05200
  • Purity: ≥99.95%, ≥99.99%
  • Dimension: Customization
  • Standard: ASTM B708-2012
  • Application: Used for optical fiber, semiconductor wafer and integrated circuit of sputtering deposition coating. Used for glass, ceramic, LCD coating. Used for the cathode sputtering coating, high vacuum suction
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Material: R05200

Purity: ≥99.95%, ≥99.99%

Dimension: Customization

Standard: ASTM B708-2012

Application: Used for optical fiber, semiconductor wafer and integrated circuit of sputtering deposition coating. Used for glass, ceramic, LCD coating. Used for the cathode sputtering coating, high vacuum suction active material etc.